Synthesis of AlN Thin Films by Dual Ion Beam Sputtering Method.

Nanocrystalline magnetite thin films grown by dual ion-beam sputtering

Point defects in Sc2O3 thin films by ion beam sputtering.

We show that the concentration of oxygen interstitials trapped in Sc2O3 films by ion beam sputtering from metal targets can be controlled by modifying deposition conditions. We have identified point defects in the form of oxygen interstitials that are present in Sc2O3 films, in significantly high concentrations, i.e., ∼10(18)  cm(-3). These results show a correlation between the increase of oxy...

Effect of Thickness on Structural and Morphological Properties of AlN Films Prepared Using Single Ion Beam Sputtering

Aluminum nitride (AlN) thin films have potential applications in microelectronic and optoelectronic devices. In this study, AlN thin films with different thicknesses were deposited on silicon substrate by single ion beam sputtering method. The X-ray diffraction (XRD) spectra revealed that the structure of films with thickness of - nm was amorphous, while the polycrystalline hexagonal AlN with a...

Comparative study of IR and UV laser damage resistance of silica thin films deposited by Electron Beam deposition, Ion Plating, Ion Assisted Deposition and Dual Ion Beam Sputtering

The laser damage resistance of optical coatings is a critical point for a large number of applications. However improving this resistance is often hard to obtain because of the large number of parameters in the deposition processes than can modify the laser damage threshold and the lack of detailed and exploitable studies published on this subject. Then, the aim of this work is to test and anal...

Laser damage resistance of silica thin films deposited by Electron Beam Deposition, Ion Assisted Deposition, Reactive Low Voltage Ion Plating and Dual Ion Beam Sputtering

The laser damage resistance of optical coatings is a key point for a large number of applications. The aim of this work is to test and analyze the laser damage resistance of a thin film material commonly used for high power applications (SiO2) and deposited with different techniques: Electron Beam Deposition, Ion Assisted Deposition, Low Voltage Reactive Ion Plating and Dual Ion Beam Sputtering...